论文标题
Moiré诱导的带镜调谐通过在INSE/CUSE垂直异质结构中改变电偶极子。
Moiré-induced bandgap tuning by varying electric dipole in InSe/CuSe vertical heterostructure
论文作者
论文摘要
堆叠的两种分层材料具有晶格常数不匹配和/或互相扭曲角度相对于彼此的扭曲角度可以产生moiré图案,从而调节原始材料的电子特性。在这里,我们结合了扫描隧道显微镜/光谱和密度函数理论计算,以研究Moiré潜在的诱导的带隙调谐在Inse/Cuse/Cuse垂直异质结构中,由两步的分子束外观次要均匀。扫描隧道显微镜测量结果表明,超晶格周期性〜3.48nm,单层之间的扭曲角约为11°。异质结构的不同堆叠位点上的扫描隧道光谱记录揭示了INSE的带隙是位置依赖性的,并且观察到400 MEV的变化。密度功能理论的计算表明,单层Inse中的Moiré-incuce电偶极子是调整带隙的关键因素。此外,CUSE和INSE之间的电荷传递还有助于带量的堆叠量变化。我们还表明,Moiré的潜力不仅可以调整Inse的带镜,而且还可以消失在某些堆叠中的Dirac Nodal线。我们的探索提供了有价值的信息,以了解二维Moiré材料的电子特性。
The stacked two layered materials with a lattice constant mismatch and/or with twist angle relative to each other can create a moiré pattern, modulating the electronic properties of the pristine materials. Here, we combine scanning tunneling microscopy/spectroscopy and density functional theory calculations to investigate the moiré potential induced bandgap tuning in InSe/CuSe vertical heterostructure synthesized by a two-step of molecular beam epitaxy. Scanning tunneling microscopy measurements demonstrate the heterostructure with a superlattice periodicity of ~3.48nm and a twist angle of about 11° between the monolayers. Scanning tunneling spectroscopy record on the different stacking sites of the heterostructure reveals the bandgap of the InSe is location-dependent and a variation of 400 meV is observed. Density functional theory calculations reveal that the moiré-induce electric dipole in the monolayer InSe is the key factor for tuning the bandgap. Besides, charge transfer between CuSe and InSe also contributes to the bandgap variation due to its stacking related. We also show that the moiré potential not only can tune the bandgap of InSe but also can vanish the Dirac nodal line of CuSe in some stackings. Our explorations provide valuable information in understanding the electronic properties of the twodimensional moiré materials.