论文标题
相掩膜针孔作为激光干扰光刻的空间过滤器
Phase mask pinholes as spatial filters for laser interference lithography
论文作者
论文摘要
激光谐振器的输出具有高斯空间束轮廓。在激光干扰光刻（LIL）中，使用这种高斯形束会导致底物的不均匀暴露。结果，底物的光刻定义特征的尺寸差异很大。在大多数LIL设置中，针孔用作去除光学噪声的过滤器。遵循Hariharan等人提出的概念。 al。可以将相位掩码添加到这些针孔中。从理论上讲，这种修饰会导致更均匀的光束曲线，如果在LIL中用作空间过滤器，则在改善的暴露量和特征尺寸均匀性中。在这里，我们报告了此类元素的首次成功制造，并证明了它们在LIL设置中的使用，以分别使用标准和修改的针孔将特征维度的变化从47.2％降低到27.5％。
Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography defined features vary significantly across the substrate. In most LIL setups, pinholes are used as filters to remove optical noise. Following a concept proposed by Hariharan et. al. a phase mask can be added to these pinholes. In theory, this modification results in a more uniform beam profile, and, if applied as spatial filters in LIL, in improved exposure and hence feature size uniformity. Here, we report on the first successful fabrication of such elements and demonstrate their use in an LIL setup to reduce feature dimension variations from 47.2% to 27.5% using standard and modified pinholes, respectively.
