论文标题
通过反应性磁控溅射的化学计量涂层沉积
Deposition of the stoichiometric coatings by reactive magnetron sputtering
论文作者
论文摘要
对化学计量涂层金属金属生物的反应性磁控沉积的研究进行了研究。研究了靶标的溅射参数与样品金属类似表面的静脉化形成过程与适当结构的涂层的形成之间的依赖性。给出了化学计量涂层ALN，AL2O3，TIN，TIO2的实验数据。反应性磁控沉积的特征和研究结果，用于获得具有预元特性的涂层，特别是为了提供涂层沉积过程的稳定性和可控性。关键字：反应性磁控溅射，涂料，氧化物，氮化物组成。
The investigations of the reactive magnetron depositing of the stoichiometric coatings metal-metalloid were done. The dependences between sputtering parameters of a target and processes of plasmochemical formation on the surface of sample metal-metalloid and formations of coatings of the appropriate structure were investigated. Experimental data on stoichiometric coatings AlN, Al2O3, TiN, TiO2 is given. Features of reactive magnetron deposition and investigation results for obtaining of coatings with pregiven properties in particular for providing stability and controllability of coating deposition processes in time. Keywords: reactive magnetron sputtering, coatings, oxide, nitride compositions.
