论文标题
BI $ _2 $ _2 $ _3 $ te $ _3 $脉冲激光沉积的电影的扫描隧道显微镜：从纳米晶体结构到范德华的同志
Scanning tunneling microscopy of Bi$_2$Te$_3$ films prepared by pulsed laser deposition: from nanocrystalline structures to van der Waals epitaxy
论文作者
论文摘要
BI $ _2 $ TE $ _3 $是一种具有高效率热电转换效率的材料。最近，它也被公认为是拓扑绝缘子，通常被用作创建其他类型的拓扑问题的基础。脉冲激光沉积（PLD）被广泛认为是生长多组分膜的简单方法，但不是范德华同际的工具。我们在这里证明，van der waals的外在bi $ _2 $ te $ _3 $确实是不可能的，但是在存在背景气体的情况下，这是可能的，这是通过扫描隧道显微镜和光谱研究的结果证实的。 {\ it ab intive}计算的结果再现了bi $ _2 $ te $ _3 $的前三个露台的隧道光谱。此外，在过热的膜中观察到类似电荷密度波的异常六边形上层建筑。
Bi$_2$Te$_3$ is a material with high efficiency of thermoelectric energy conversion. Recently, it was also recognized as a topological insulator, and is often used as the basis for creation of other types of topological matter. Pulsed laser deposition (PLD) is widely considered as a simple method for growing of multicomponent films, but not as a tool for van der Waals epitaxy. We demonstrate here that the van der Waals epitaxy of Bi$_2$Te$_3$ is indeed impossible in vacuum PLD, but is possible in the presence of a background gas, which is confirmed by the results of scanning tunneling microscopy and spectroscopy studies. Results of {\it ab initio} calculations reproduce tunneling spectra of the first three terraces of epitaxial films of Bi$_2$Te$_3$. In addition, an unusual hexagonal superstructure resembling a charge-density wave is observed in overheated films.
