论文标题
在石墨烯上的碳adatom迁移屏障的间接测量
Indirect measurement of the carbon adatom migration barrier on graphene
论文作者
论文摘要
尽管表面扩散对于许多物理和化学过程至关重要，包括晶体的外延生长和异质催化，但直接研究尤其具有挑战性。在这里，我们通过量化其温度依赖性电子敲入损伤来估计独立单层石墨烯对碳adtom迁移屏障。由于空缺通过扩散的adatoms快速愈合，损伤率随温度升高而降低。通过使用描述我们有限扫描探针的模型分析300-1073 K时观察到的损伤率，我们发现了（0.33 \ pm 0.03）EV的屏障。
Although surface diffusion is critical for many physical and chemical processes, including the epitaxial growth of crystals and heterogeneous catalysis, it is particularly challenging to directly study. Here, we estimate the carbon adatom migration barrier on freestanding monolayer graphene by quantifying its temperature-dependent electron knock-on damage. Due to the fast healing of vacancies by diffusing adatoms, the damage rate decreases with increasing temperature. By analyzing the observed damage rates at 300-1073 K using a model describing our finite scanning probe, we find a barrier of (0.33 \pm 0.03) eV.
