论文标题
刺激的发射量为1.54 $μ$ m,来自掺杂硅的Erbium/氧气发射二极管发射二极管
Stimulated emission at 1.54 $μ$m from Erbium/Oxygen-doped silicon-based light emitting diodes
论文作者
论文摘要
迫切需要基于硅的光源,包括发光二极管(LED)和激光二极管(LDS),以进行信息传输,以开发整体式综合硅光子学。用Erbium离子植入离子(ER $^{3+} $)掺杂的硅被认为是一种有前途的方法,但具有极低的量子效率。在这里,我们报告了来自ER/O掺杂硅平面LED的1.54 $ $ m $ m $ m的电泵式超线性发射,该发射是通过应用新的深冷却过程产生的。室温下的刺激发射量低约6 mA(〜0.8 A/CM2)。时间分辨的光致发光和光电流结果通过从硅的间接传导带中放松电子来揭示从硅到ER3+的复杂载体转移动力学。这张图片与硅宿主的电子孔对重组的经常出现的能量转移不同。此外,LED的放大发射可能是由于深冷却技术创建的准连续ER/O相关供体带。这项工作铺平了一种基于稀土掺杂硅的通信波长,在通信波长下制造超浮动二极管或有效的LDS的方法。
Silicon-based light sources including light-emitting diodes (LEDs) and laser diodes (LDs) for information transmission are urgently needed for developing monolithic integrated silicon photonics. Silicon doped by ion implantation with erbium ions (Er$^{3+}$) is considered a promising approach, but suffers from an extremely low quantum efficiency. Here we report an electrically pumped superlinear emission at 1.54 $μ$m from Er/O-doped silicon planar LEDs, which are produced by applying a new deep cooling process. Stimulated emission at room temperature is realized with a low threshold current of ~6 mA (~0.8 A/cm2). Time-resolved photoluminescence and photocurrent results disclose the complex carrier transfer dynamics from the silicon to Er3+ by relaxing electrons from the indirect conduction band of the silicon. This picture differs from the frequently-assumed energy transfer by electron-hole pair recombination of the silicon host. Moreover, the amplified emission from the LEDs is likely due to a quasi-continuous Er/O-related donor band created by the deep cooling technique. This work paves a way for fabricating superluminescent diodes or efficient LDs at communication wavelengths based on rare-earth doped silicon.