论文标题

无定形TA2O5和TIO2的光散射与退火温度的测量:TA2O5薄膜

Measurements of Optical Scatter Versus Annealing Temperature for Amorphous Ta2O5 and TiO2:Ta2O5 Thin Films

论文作者

Capote, Elenna M., Gleckl, Amy, Guerrero, Jazlyn, Rezac, Michael, Wright, Robert, Smith, Joshua R.

论文摘要

由无定形氧化物薄膜形成的光学涂层在精确测量中有许多应用。先进的激光干涉仪重力波观测站(Ligo)和先进的处女座使用Sio $ _2 $(硅)和Tio $ _2 $:TA $ _2 $ _2 $ o $ _5 $(Titania Doped Tantala)和寄生后的寄生后退火至500 $^\ Circe $ c $^\ \ codce $ c,可实现低热量噪声的涂料。这些涂层的光学散射是检测器灵敏度的关键限制。本文介绍了融合二氧化硅基板上的单层离子束式薄膜的光散射测量:两个$ _2 $ _2 $ o $ _5 $的样品和两个tio $ _2 $:ta $ _2 $ _2 $ o $ o $ _5 $。使用成像散射计的固定散射角为12.8 $^\ Circ $,在沉积后退火期间,评估了每个样品的光散射的原位变化,以真空的真空中的500 $^\ Circ $ C。观察到四个涂层光学元件中的三个散布在退火过程中减少了25-30 $ \%$,对于二氧化钛掺杂的tantala而言,散布最高为74美元$ \%$,而第四个样品的散射则保持常数。真空退火之前和之后进行的角度分辨散射测量表明,四个样品中的三个有所改善。这些结果表明,在真空中,单层Tantala和掺杂的Tantala薄膜的沉积后高温退火不会导致散射增加,并且实际上可能会改善其散射。

Optical coatings formed from amorphous oxide thin films have many applications in precision measurements. The Advanced Laser Interferometer Gravitational-Wave Observatory (LIGO) and Advanced Virgo use coatings of SiO$_2$ (silica) and TiO$_2$:Ta$_2$O$_5$ (titania doped tantala) and post-deposition annealing to 500$^\circ$C to achieve low thermal noise and low optical absorption. Optical scattering by these coatings is a key limit to the detectors' sensitivity. This paper describes optical scattering measurements for single-layer ion-beam-sputtered thin films on fused silica substrates: two samples of Ta$_2$O$_5$ and two of TiO$_2$:Ta$_2$O$_5$. Using an imaging scatterometer at a fixed scattering angle of 12.8$^\circ$, in-situ changes in the optical scatter of each sample were assessed during post-deposition annealing to 500$^\circ$C in vacuum. The scatter of three of the four coated optics was observed to decrease during the annealing process, by 25-30$\%$ for tantala and up to 74$\%$ for titania-doped tantala, while scatter from the fourth sample held constant. Angle-resolved scatter measurements performed before and after vacuum annealing suggests some improvement in three of four samples. These results demonstrate that post-deposition high-temperature annealing of single-layer tantala and titania-doped tantala thin films in vacuum does not lead to an increase in scatter, and may actually improve their scatter.

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