论文标题
在118 nm处真空紫外线的表征
Characterization of a vacuum ultraviolet light source at 118 nm
论文作者
论文摘要
118 nm处的真空紫外线（VUV）光已被证明是使各种气相化学研究分子电离分子的强大工具。可以通过从Xenon气体中的ND：YAG激光器三倍的355 nm灯三倍的频率三倍的频率产生的118 nm光的顶部桌面来源。该过程的效率低，通常仅产生vuv光的NJ/脉冲。三胞化过程的简单模型预测产生的118 nm光的功率应随着氙气压力的增加而四倍地增加。但是，已经观察到实验性的118 nm产生达到最大值，然后随着氙压压力的增加而降至零。在这里，我们描述了生产118 nm光的基本理论和实验设置，以及基于压力扩大的吸收而限制生产的新型模型。
Vacuum ultraviolet (VUV) light at 118 nm has been shown to be a powerful tool to ionize molecules for various gas-phase chemical studies. A convenient table top source of 118 nm light can be produced by frequency tripling 355 nm light from a Nd:YAG laser in xenon gas. This process has a low efficiency, typically producing only nJ/pulse of VUV light. Simple models of the tripling process predict the power of 118 nm light produced should increase quadratically with increasing xenon pressure. However, experimental 118 nm production has been observed to reach a maximum and then decrease to zero with increasing xenon pressure. Here, we describe the basic theory and experimental setup for producing 118 nm light and a new proposed model for the mechanism limiting the production based on pressure broadened absorption.
