论文标题

石墨烯对硅:硅表面取向对石墨烯的工作函数和载体密度的影响

Graphene on silicon: effects of the silicon surface orientation on the work function and carrier density of graphene

论文作者

Sun, Y. W., Holec, D., Gehringer, D., Li, L., Fenwick, O., Dunstan, D. J., Humphreys, C. J.

论文摘要

密度功能理论已被用来研究石墨烯对硅(SI)底物的(111),(100)和(110)表面。有几个有趣的发现。首先,石墨烯中的碳原子与Si原子共价键,当在Si(111)和(100)表面上放置足够近的键,而在(110)表面上则不足。 Si(111)表面的存在将石墨烯的费米水平移至其导带中,从而导致功能增加了0.29 eV,电子密度增加了三个数量级。由于迪拉克点附近的状态密度的修饰,在不掺杂的情况下,石墨烯的载体密度也可以增加80倍。在SI上不能形成界面共价键(110)。这些惊人的效果,即硅底物对石墨烯特性的不同取向与硅表面的表面密度有关。将结果应用于特定方向的真实装置需要进一步考虑表面重建,晶格不匹配,温度和环境影响。

Density functional theory has been employed to study graphene on the (111), (100) and (110) surfaces of silicon (Si) substrates. There are several interesting findings. First, carbon atoms in graphene form covalent bonds with Si atoms, when placed close enough on Si (111) and (100) surfaces, but not on the (110) surface. The presence of a Si (111) surface shifts the Fermi level of graphene into its conduction band, resulting in an increase of the work function by 0.29 eV and of the electron density by three orders of magnitude. The carrier density of graphene can also be increased by eighty times on a Si (100) substrate without doping, due to the modification of the density of states near the Dirac point. No interfacial covalent bond can be formed on Si (110). These striking effects that different orientations of a silicon substrate can have on the properties of graphene are related to the surface density of the silicon surface. Applying the results to a real device of a specific orientation requires further consideration of surface reconstructions, lattice mismatch, temperature, and environmental effects.

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