论文标题
薄膜生长情景和它们之间的过渡的晶格气体研究：底物的作用
Lattice gas study of thin film growth scenarios and transitions between them: Role of substrate
论文作者
论文摘要
薄膜的生长在两种类型的晶格气模型中进行了研究，其中底物和膜颗粒不同，并由不等的相互作用能量参数表达。第一种是固体固体类型的，而第二种则结合了膜上上方的气相的解吸，并在膜上重新吸附（适合在胶体系统中生长）。粒子基层和粒子粒子相互作用之间的差异起着膜形态在中间时间的演变起着核心作用。这些模型表现出动态分层过渡，该转变通常在底物吸引强度较低的情况下，而不是平衡分层过渡。在中间沉积时间下，初始岛的生长转化为逐层生长，发现了第二个变平的过渡。结合在非常大的沉积时间的此类模型中的已知粗糙行为结合在一起，我们提出了四种全球增长情景，列出了可能的粗糙度演化类型。
Thin film growth is investigated in two types of lattice gas models where substrate and film particles are different, expressed by unequal interaction energy parameters. The first is of solid-on-solid type, whereas the second type incorporates desorption, diffusion in the gas phase above the film and re-adsorption at the film (appropriate for growth in colloidal systems). The difference between particle-substrate and particle-particle interactions plays a central role for the evolution of the film morphology at intermediate times. The models exhibit a dynamic layering transition which occurs at generally lower substrate attraction strengths than the equilibrium layering transition. A second, flattening transition is found where initial island growth transforms to layer-by-layer growth at intermediate deposition times. Combined with the known roughening behavior in such models for very large deposition times, we present four global growth scenarios, charting out the possible types of roughness evolution.
