论文标题
有机无机连接中的Ångström分辨界面结构
Ångström-resolved Interfacial Structure in Organic-Inorganic Junctions
论文作者
论文摘要
由复杂的界面电子结构控制的界面的电荷传输过程在催化反应，能量储存，光伏和许多生物学过程中起着至关重要的作用。在这里，报道了第一个软X射线第二次谐波生成（SXR-SHG）的界面界面（硼/parylene-n）的界面光谱。 SXR-SHG显示出不同的光谱特征，这些特征在X射线吸收光谱中未观察到，表明其非凡的界面灵敏度。与电子结构计算相比，表明硼和有机分离距离为1.9Å，其中，其变化小至0.1Å导致易于检测到可检测到的SXR-SHG光谱偏移（MEV大约100s）。由于SXR-SHG本质上是超快的，并且对单个原子层敏感，因此它可能会研究各种界面过程，例如催化，具有超快的时间分辨率和键特异性。
Charge transport processes at interfaces which are governed by complex interfacial electronic structure play a crucial role in catalytic reactions, energy storage, photovoltaics, and many biological processes. Here, the first soft X-ray second harmonic generation (SXR-SHG) interfacial spectrum of a buried interface (boron/Parylene-N) is reported. SXR-SHG shows distinct spectral features that are not observed in X-ray absorption spectra, demonstrating its extraordinary interfacial sensitivity. Comparison to electronic structure calculations indicates a boron-organic separation distance of 1.9 Å, wherein changes as small as 0.1 Å result in easily detectable SXR-SHG spectral shifts (ca. 100s of meV). As SXR-SHG is inherently ultrafast and sensitive to individual atomic layers, it creates the possibility to study a variety of interfacial processes, e.g. catalysis, with ultrafast time resolution and bond specificity.
