论文标题
在薄合金膜的定量X射线荧光分析中二级荧光激发的验证
Validation of secondary fluorescence excitation in quantitative X-ray fluorescence analysis of thin alloy films
论文作者
论文摘要
X射线荧光（XRF）分析是一种广泛应用的技术，用于对薄膜的定量分析，高于$ $ m，因为它的非破坏性性质很容易自动化。当需要低百分比范围内的分析结果的低不确定性时，多元样品中的非线性二级荧光效应可能会使原本直接的定量复杂化，因为它很容易超过20％的相对贡献。依靠良好性能参考样品的常规解决方案受到低可用性的阻碍，尤其是对于薄膜应用。为了应对这一挑战，我们展示了一种具有显着二级荧光贡献的多层合金薄膜的灵活生产方法。我们使用无参考XRF分析来验证二次荧光的物理模型的可靠性，其中包括彻底的不确定性估计。研究的样品被作为XRF或其他定量分析的校准样品的资格。
X-ray fluorescence (XRF) analysis is a widely applied technique for the quantitative analysis of thin films up to the $μ$m scale because of its non-destructive nature and because it is easily automated. When low uncertainties of the analytical results in the few percent range are required, the non-linear secondary fluorescence effect in multi-elemental samples may complicate an otherwise straightforward quantification, since it can easily exceed a relative contribution of 20%. The conventional solution, to rely on good performing reference samples, is hindered by their low availability, especially for thin film applications. To address this challenge, we demonstrate a flexible production method of multilayered, alloyed thin films with significant secondary fluorescence contributions. We use reference-free XRF analysis to validate the reliability of the physical model for secondary fluorescence, which includes a thorough uncertainty estimation. The investigated specimens are being qualified as calibration samples for XRF or other quantitative analyses.
